Industrial Wafer Magneto-Optical Kerr Measuring Instrument
Classification
Keywords
- Product Description
- Technical Indicators
- Applications
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Product Model:
Wafer-MOKE
Product Overview:
This product enables rapid global detection of the magnetic properties of wafer film stacks utilizing the polar/longitudinal magneto-optical Kerr effect (MOKE). With non-contact measurement that avoids the damage to wafers caused by conventional magnetic characterization, it can be applied to the testing of samples before and after patterning. It provides a vertical magnetic field of up to 2.5 T and an in-plane field of up to 1.4 T. A high magnetic field induces reversal of the free, reference and pinned layers of a vertical anisotropic magnetic random access memory (MRAM) film stack. With an ultra-high Kerr detection sensitivity, it is capable of characterizing subtle magnetic changes in different film layers simultaneously in a single pass. The combination of laser point-by-point probing and scanning imaging enables the rapid creation of a global magnetic property map of a wafer to assist in process optimization and yield control.
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● Sample size: Support up to 12-inch wafer testing, downward compatible with fragment testing
● Magnetic field: maximum perpendicular magnetic field is greater than ±2.5 T, maximum in-plane magnetic field is greater than 1.4 T, and resolution of 0.01 mT
● Magnetic detection sensitivity: Kerr rotation detection is greater than 0.2 mdeg (RMS), suitable for magnetic characterization of multilayer film stacks
● Sample repositioning resolution: ≤2 µm
Functions and Applications:
● Vertical hysteresis loop measurement of MRAM film stacks and device arrays (Polar Kerr for MRAM)
● Vertical hysteresis loop measurement of disks and other magnetic storage media (Polar Kerr for PMR Disk)
● In-plane hysteresis loop measurement of magnetic sensing device film stacks
● Hysteresis loop information, such as Hc, Hex, and Ms of free and pinned layers (Kerr corner value), is automatically extracted, and the distribution of magnetic properties of wafers can be quickly mapped.
● The system is preset with single-spot, array, ring distribution and other spot scanning modes, and supports the import of custom position lists.
● The system is available in manual loading or fully automatic operation to meet R&D/production requirements.
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Measurement results of hysteresis loop of magnetic tunnel junctions with perpendicular anisotropy
Coercive field characteristic distribution of 8-inch wafers with perpendicular magnetic anisotropy
Industrial Wafer Magneto-Optical Kerr Measuring Instrument
Classification
Keywords
Intention Table
Application Industry
Provide reliable equipment for China's IC manufacturing, empowering technological innovation through precision measurement!
Contact Information
Business Inquiries:+86-532-89267428/13335086685Manager Yao
Switchboard:+86-532-89269848
Company Address: 393 Songling Road, Laoshan District, Qingdao, Shandong Province, China
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