Scientific-Grade Magnetron Sputtering System

Classification

Keywords

Product Model:

MS-400

Product Overview:

This magnetron sputtering system is a multi-functional, multi-target magnetron sputtering system that has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy, and straightforward maintenance. The MS-400 system provided six 2-inch confocal UHV cathodes as standard to meet the requirements of process research in (corporate) laboratories, with simple maintenance and stable operation.

Wafer size	4 inch, downward compatible
Film-coating uniformity	±2%
Ultimate vacuum	5 × 10-9 mbar（Metallic seal ）
Temperature control	RT–1000°C
Number of cathodes	6~7 pcs 2-inch
Power supply	DC、RF、DC Pulse
Deposition accuracy	0.1 nm
Area	L×W×H: 3 m × 2 m × 2 m
Optional	Co-sputtering, cryopump, vertical sputtering, automatic transfer, reactive sputtering, film thickness gauge, process menu, among others