Wafer-level Atomic Force Microscope

Classification

Keywords

Product Model:

AtomMax

Product Overview:

The AtomMax Wafer-level Atomic Force Microscope utilizes a microcantilever probe structure to perform sub-nanometer-scale 3D scanning and imaging of solid materials such as conductors, semiconductors, and insulators, enabling topographic characterization and analysis of wafer-level large samples. Combined with optical imaging, the motorized sample stage achieves a positioning accuracy of 1 µm over a 200×200 mm area. The optical structure is integrated with the scanning head, featuring high automation and user-friendly operation.

Equipment Performance

Sample size	8-inch wafer and backward compatible
Scanning range	100 μm×100 μm×10 μm
Scanning angle	0-360°
Z-direction linearity	0.2%
Noise level in the Z direction	0.06 nm
Image sampling point	32×32 - 4096×4096
Working mode	Contact mode, tap mode, phase imaging mode, lift mode, multi-directional scanning mode
Multifunctional measurement	Electrostatic force microscope (EFM), scanning Kelvin microscope (KFM), piezoelectric force microscope (PFM), magnetic force microscope (MFM); optional: Conductive atomic force microscope (C-AFM)