E-Beam Evaporation System

Classification

Keywords

Product Model:

E-Beam-UHV

Product Overview:

The E-beam evaporation system prepares accurate multi-layer films in high vacuum environment. The linear electron beam gun allows for the evaporation of a variety of materials. The Kaufman ion source can be optional for the pre-cleaning of wafers, can be used in the superconducting quantum field, and it is suitable for research and development of universities and enterprises and small-scale production occasions.

Wafer size	4 inch–8 inch
Ultimate vacuum	Better than 1 × 10-9 mbar
Temperature control	RT–800℃
Electron beam gun	UHV linear electron beam gun, with optional crucible quantity and capacities (standard configuration 10 KW, 6 × 15 cc)
Water cleaning	Kaufman ion source is optional for wafer cleaning purposes
Cleaning uniformity	Example: The cleaning uniformity of 4-inch wafers is better than ±3%
Control system	PC + PLC, full-automatic operation, and safety interlocking
Sample stage	180°incline and 360°rotation functions, with optional elevation and biasing
Measurement of film thickness	Film thickness gauge, telescopic
Area	L×W×H: 3 m × 2 m × 2 m
Optional	Cryopump, automatic transfer, process menu, etc.