Wafer-Level Magnetron Sputtering Series

Classification

Keywords

Product Model:

MSI-100

Product Overview:

The wafer-level magnetron sputtering system is a series of high-performance and high-efficiency magnetron sputtering equipment developed for laboratories and production lines of manufacturers. MSI-100 magnetron sputtering equipment adopts a simple and reliable design to meet the production and preparation demands of simple materials, featuring stability, reliability, and low cost.

Wafer size	8 inch, downward compatible
Film-coating uniformity	±3%
Ultimate vacuum	1 × 10-8 mbar
Temperature control	RT–1,000℃
Number of cathodes	Four 4-inch
Power supply	DC, RF, DC Pulse
Area	L×W×H: 3 m × 2 m × 2 m
Optional	Sputtering angle and direction, cryopump, sample injection chamber (casette), reactive sputtering, film thickness gauge, process menu, etc.