Pulsed Laser Deposition Series

Classification

Keywords

Product Model:

PLD-400

Product Overview:

The pulsed laser deposition series equipment serves as a staple for oxide and multi-component thin film deposition in universities and research institutions, renowned for its simplicity, reliability, and operational stability. The PLD-400 pulsed laser deposition equipment, equipped with six 1-inch targets as standard and capable of in situ target replacement, collaborates with RHEED and excimer lasers to achieve high-quality thin film deposition.

Wafer size	2 inch
Ultimate vacuum	5 × 10-9 mbar
Temperature control	RT–1,200°C
Number of target stages	Six 1-inch target materials, with a combined rotation and revolution design
Target materials replacement	Replace the target materials in situ
Laser source	Excimer laser, optional
Conventional materials	BFO, SRO, VO2, etc.
Area	L×W×H: 3 m × 2 m × 2 m
Optional	Cryopump, automatic transfer, reactive sputtering, film thickness gauge, process menu, high-voltage RHEED, etc.