Molecular Beam Epitaxy (MBE) System

Classification

Keywords

Product Model:

MBE-400

Product Overview:

The MBE system serves as the core equipment in laboratories for fabricating high-performance thin films of single-crystal materials and is applicable in the production of high-grade oxide materials, topological insulators, and the like. The system adopts a modular design that facilitates subsequent upgrades and maintenance and allows for deposition of a variety of materials by interconnecting with other devices of our company.

Wafer size	2 inch
Ultimate vacuum	Better than 1 × 10-10 mbar
Vacuum measurement	Ionization gauge + cathode gauge + pirani gauge
Vacuum pump unit	Mechanical pump + molecular pump + adsorption pump + cold trap (liquid nitrogen, optional)
Temperature control	RT–800°C, and optional for RT–1,200°C
Evaporator source	Six to ten different types of evaporation sources and electron beam sources are optional
Film thickness measurement	Film thickness gauge, telescopic
In-situ monitoring	RHEED, optional
Sample injection chamber	Loading up to 6 2-inch wafers
Control system	PC + PLC, full-automatic operation, and safety interlocking
占地面积 Area	L×W×H: 3 m × 2 m × 2 m
Optional	Cryopump, automatic transfer, reactive sputtering, film thickness gauge, process menu, high-voltage RHEED, etc.