Scientific-Grade Magnetron Sputtering System

Classification

Keywords

Product Model:

MS-700

Product Overview:

This magnetron sputtering system is a multi-functional, multi-target magnetron sputtering system that has the characteristics of ultra-high vacuum and single atomic layer deposition accuracy. Circular cathodes up to 4 inches in diameter can be configured according to needs, with options such as co-sputtering, vertical sputtering, automatic sample transfer, and reactive sputtering available for selection. It meets the requirements of high-precision processes and multi-target sputtering in R&D and production.

Wafer size	4 inch - 6 inch
Film-coating uniformity	±2%
Ultimate vacuum	5 × 10-9 mbar（Metallic seal ）
Temperature control	RT–1000°C
Number of cathodes	Twelve 2-inch or six 4-inch
Power supply	DC、RF、DC Pulse
Deposition accuracy	0.1 nm
Area	L×W×H: 4 m × 3 m × 2.5 m
Optional	Co-sputtering, cryopump, vertical sputtering, automatic transfer, reactive sputtering, film thickness gauge, process menu, among others