Scientific-Grade Magnetron Sputtering System

Classification

Keywords

Product Model:

MS-200

Product Overview:

The MS-200 magnetron sputtering system is a compact benchtop sputtering system that boasts high vacuum capabilities and single atomic layer deposition precision, as well as flexible options for cathode sputtering upwards or downwards. The equipment has one 2-inch UHV cathode as standard. Satisfy the needs of simple material research.

Wafer size	4 inch, downward compatible
Film-coating uniformity	±2%
Ultimate vacuum	1 × 10-8 mbar
Temperature control	RT–800°C
Number of cathodes	One 2-inch or three 1-inch
Power supply	DC, RF, DC Pulse
Deposition accuracy	0.1 nm
Area	L×W×H: 1.5 m × 1 m × 1.5 m
Optional	Sample injection chamber, reactive sputtering, process menu, etc.